ASML reaffirms commitment to laser-produced plasma systems, dismisses free-electron laser technology
In the past 24 hours, ASML has maintained its focus on laser-produced plasma (LPP) systems for generating extreme ultraviolet (EUV) light, essential for advanced chip manufacturing. Despite growing interest in free-electron laser (FEL) technology, including support from Elon Musk, ASML remains skeptical due to the complexity and high costs associated with FEL infrastructure. The company continues to enhance its LPP systems, aiming to increase source power to 1,000W and double tin droplet output to 100,000 per second.
Key points
- ASML reaffirms commitment to LPP systems, dismisses FEL technology
- ASML plans to increase LPP source power to 1,000W and double tin droplet output
Sources
AI-generated from public news sources. Not financial advice.

