Neutral
ASML reaffirms commitment to laser-produced plasma EUV technology, dismisses free-electron lasers.
In the past 24 hours, ASML has maintained its focus on laser-produced plasma (LPP) systems for extreme ultraviolet (EUV) lithography, despite growing interest in free-electron laser (FEL) technology. The company continues to invest in enhancing LPP systems, aiming to increase EUV source power to 1,000W. ASML's decision underscores its confidence in the current EUV technology and its skepticism toward the feasibility of FELs in semiconductor manufacturing.
Key points
- ASML reaffirms commitment to LPP EUV technology, dismisses FELs.
- Company plans to boost EUV source power to 1,000W.
- ASML expresses skepticism about FELs' viability in chipmaking.
Sources
AI-generated from public news sources. Not financial advice.
